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2004-2-13 |
ȼº Ž»ç¼±ÀÇ Camera IC, Tanner»çÀÇ EDA ±â¼ú·Î ¼³°è
Tanner Research»çÀÇ ÀÚȸ»çÀÎ Tanner EDA»ç¿¡¼´Â ÀÚ»çÀÇ ¼ÒÇÁÆ®¿þ¾î·Î ¼³°èµÈ ¹ÝµµÃ¼ Á÷Á¢ ȸ·Î°¡ ¹Ì¿¬¹æ ¿ìÁÖ Ç×°ø±¹(NASA)ÀÇ È¼º Ž»ç¼±ÀÎ 'Opportunity'¿Í 'Spirit'ÀÇ Ä«¸Þ¶ó¿¡ ÀåÂøµÇ¾î ¼º°øÀûÀ¸·Î ÀÛµ¿Çϰí ÀÖ´Ù°í ¹ßÇ¥Çß´Ù. |
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2004-1-19 |
IMS, Â÷·®¿ë ¼¾¼ ±â¼ú Áö¼ÓÀûÀ¸·Î ¼ºÀå ¿¹Ãø
IMS Research»ç´Â "Àü¼¼°è ÀÚµ¿Â÷ ¼¾¼ ½ÃÀå"À̶ó´Â ÃֽŠº¸°í¼¿¡¼ ÀÚµ¿Â÷ ¼¾¼ ±â¼úÀº ÇâÈÄ 10³â°£ °è¼ÓÇØ¼ ¼ºÀåÇÒ °ÍÀ¸·Î ¿¹»óÇß´Ù. |
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2004-1-5 |
Á¤º¸ ¼Õ½Ç ¹æÁöÇÏ´Â ADIÀÇ MEMS °¡¼Óµµ ¼¾¼
ADI»ç´Â Active Protection System ±â¼úÀ» Ư¡À¸·Î ÇÏ´Â IBM»çÀÇ ThinkPad ¸ð¹ÙÀÏ ÄÄÇ»ÅÍ ¸ÖƼ Ç÷§Æû¿¡ »ç¿ëµÉ iMEMS °¡¼Óµµ ¼¾¼ ±â¼úÀ» ¹ßÇ¥Çß´Ù. |
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2003-11-20 |
Ultratech, Infotonics ¼¾ÅÍ¿¡¼ ´Ù¼ö Àåºñ ¼öÁÖ
Ultratech»ç´Â ´º¿åÁÖÀÇ Center of Excellence in Photonics and Microsystems¸¦ ¿î¿µÇϱâ À§ÇØ 2001³â¿¡ ¼³¸³µÈ ºñ¿µ¸® ´ÜüÀÎ Infotonics Technology Center·ÎºÎÅÍ ÀÚ»çÀÇ NanoTech 160 ¾çÂÊ ¹è¿ (DSA) ½ºÅ×ÆÛ¿Í Ãà¼Ò ½ºÅ×ÆÛ¿¡ ´ëÇÑ ÁÖ¹®À» ¹Þ¾Ò´Ù. |
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2003-11-20 |
EV Group, DALSA»çÀÇ Àü·«Àû °ø±ÞÀÚ·Î ¼±Á¤
MEMS, ³ª³ë¿Í ¹ÝµµÃ¼ ¿þÀÌÆÛ °¡°ø Àåºñ Á¦Á¶ÀÚÀÎ EV Group(EVG)»ç´Â DALSA Semiconductor»çÀÇ MEMS ¿þÀÌÆÛ °áÂø°ú µÎ²¨¿î ÁßÇÕü ½Ä°¢ ¹ÝµµÃ¼ »ý»êÀåºñ¿¡ ´ëÇÑ Àü·«Àû °ø±ÞÀÚ·Î ¼±Á¤µÇ¾ú´Ù. |
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2003-11-18 |
Keithley, Zyvex»ç¿Í ÆÇ¸ÅÇù·ÂÇùÁ¤ ü°á
Keithley Instruments»ç¿Í Zyvex»ç´Â ³ª³ëÅ×Å© ½ÃÀåÀ» À§ÇÑ »õ·Î¿î ¼Ö·ç¼ÇÀ» °³¹ßÇϱâ À§ÇÑ Çù·ÂÇùÁ¤À» ü°áÇß´Ù. |
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2003-11-17 |
STMicroelectronics, MobiDiag»ç¿Í ÇÔ²² ºÐÀÚ Áø´Ü¿ë ¹ÙÀÌ¿ÀĨ °³¹ßÇϱâ·Î
STMicroelectronics»ç´Â MobiDiag»ç¿Í ÇÔ²² 17ÀÏ ½Ç¸®ÄÜ MEMS (Micro Electro Mechanical Systems) ¹ÙÀÌ¿ÀĨ ±â¹Ý Àü¿°º´ °Ô³ð ±â¹Ý °ËÃâ¿ë ½Ã½ºÅÛÀ» °³¹ßÇϱâ·Î ÇÏ¿´´Ù. |
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2003-11-14 |
Information Network, MEMS ¸¶ÀÌÅ©·ÎÆùÀÇ ³ôÀº ¼ºÀå ¿¹Ãø
The Information Network»ç°¡ ÃÖ±Ù¿¡ ¹ßÇ¥ÇÑ " ¸¶ÀÌÅ©, ½ºÇÇÄ¿, ÄÚµ¦, ±×¸®°í ÃÖÁ¾ Àû¿ëºÐ¾ßµî À½ÇâÁ¦Ç°¿¡ ´ëÇÑ ½ÃÀå ºÐ¼®" º¸°í¼¿¡ µû¸£¸é MEMS ±â¼úÀº 2003³â¿¡ 12¾ï°³°¡ ÆÈ·Á¼ 1 ÆÛ¼¾Æ® ¹Ì¸¸ÀÇ ¼ºÀåÀ» ±â·ÏÇÑ ¸¶ÀÌÅ©·ÎÆù |
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2003-11-11 |
STMicro, MobiDiag»ç¿Í ¹ÙÀÌ¿ÀĨ °³¹ß ÇùÁ¤ ü°á
STMicroelectronics»ç´Â MobiDiag»ç¿Í ½Ç¸®ÄÜ MEMS ¹ÙÀÌ¿ÀĨÀ» ¹ÙÅÁÀ¸·Î ÇÏ¿© Àü¿°º´ÀÇ °Ô³ð ±â¹Ý °ËÃâÀ» À§ÇÑ ¿Ïº®ÇÑ ½Ã½ºÅÛÀ» »ý¼ºÇÒ °øµ¿°³¹ßÇùÁ¤À» ü°áÇß´Ù. |
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2003-11-3 |
Á¤ÅëºÎ, IT ÇٽɺÎǰ »ê¾÷¿¡ 4,080¾ï¿ø ÅõÀÚÇϱâ·Î
Á¤º¸Åë½ÅºÎ´Â Áö³ 31ÀÏ Á¶¼±È£ÅÚ¿¡¼ ¾à 300¸íÀÇ ¾÷°è °ü°èÀÚ, Çаè Àü¹®°¡ µîÀÌ Âü¼®ÇÑ °¡¿îµ¥ `IT ÇٽɺÎǰ À°¼ºÀü·« °øÃ»È¸`¸¦ °³ÃÖÇÏ¿© ¿À´Â 2007³â±îÁö 4,080¾ï¿øÀ» ITÇٽɺÎǰ »ê¾÷À» À°¼º½Ã۴µ¥ ÅõÀÚÇϱâ·Î Çß´Ù. |
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2003-10-22 |
IMEC, EVG¿Í ¿þÀÌÆÛ ¼öÁØÀÇ ÆÐŰ¡°ú ¿þÀÌÆÛ Á¢Âø ±â¹ý¿¡ °üÇØ Á¦ÈÞ
Asahi Glass»ç´Â Á¾·¡ÀÇ Á¦Ç°¿¡ ºñÇØ ¿¡³ÊÁö ¹Ðµµ¸¦ °ÅÀÇ 3¹è³ª °³¼±ÇÑ Àü±â ÀÌÁßÃþ Äܵ§¼¸¦ °³¹ßÇß´Ù°í ¹ßÇ¥Çß´Ù. |
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2003-10-20 |
Tanner, ȸ·Îµµ¸é¿ë Åø Ãâ½Ã
Tanner EDA»ç´Â ÀÚ»çÀÇ L-Edit ¼³°è ¼ÒÇÁÆ®¿þ¾î¸¦ À§ÇÑ È¸·Îµµ¸é Á¶ÀÛ Åø L-Edit/SDLÀ» Ãâ½ÃÇß´Ù. |
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2003-10-16 |
ÃÖÃÊ·Î ½Ã¿¬ µÈ MEMS ±â¹ÝÀÇ ´Ùä³Î °¡º¯ »ö ºÐ»ê º¸»ó±â
»ö ºÐ»êÀÇ °ü¸®´Â ³ôÀº ºñÆ® Àü¼Û·üÀÇ DWDM ½Ã½ºÅÛ¿¡¼ °¡Àå Áß¿äÇÑ ±â¼úµé °¡¿îµ¥ ÇϳªÀÌ´Ù.±¤¼¶À¯ Åë½Å ÄÁÆÛ·±½º ³í¹®ÀÎ "MEMS ¹× ȸÀý °ÝÀÚ ±â¹ÝÀÇ ´Ùä³Î °¡º¯ »ö ºÐ»ê º¸»ó±â"ÀÇ ³»¿ëÀ» °£´ÜÈ÷ »ìÆì º»´Ù. |
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2003-10-9 |
SUSS MicroTec, ȹ±âÀûÀÎ ¿þÀÌÆÛ º»µù ±â¼ú ¹ßÇ¥
SUSS MicroTec AG´Â Ç¥¸é µ¿ÀÛ ¹æ½Ä°ú ³ª³ë PREP¶ó°í ÇÏ´Â ¿þÀÌÆÛ Åõ ¿þÀÌÆÛ ¿¬°á ¹æ½ÄÀ» µµÀÔÇß´Ù. SUSS MicroTec»ç¿¡ ÀÇÇϸé ÀÌ ¹æ½ÄÀº DWB (direct wafer bonding)À» ÀÌ¿ëÇÏ´Â SOI¿Í º¯Çü ½Ç¸®ÄÜ °°Àº ¹ÝµµÃ¼ Àç·á Á¦ÀÛÀ» °¡´ÉÇÏ°Ô ÇÑ´Ù. |
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2003-9-25 |
TIÀÇ Á¦¾î±â, BEI»çÀÇ ¼¾¼ ±â¼ú Áö¿ø
Texas Instruments(TI)»ç´Â (BEI Technologies»çÀÇ »ç¾÷ºÎ¹®ÀÎ BEI Systron Donner Inertial Division(SDID)ÀÌ ÀÚ»çÀÇ BEI MEMS °ü¼º ÃøÁ¤ÀåÄ¡(IMU)ÀÎ MMQ-50¿¡ »ç¿ëÇϱâ À§ÇØ TI»çÀÇ TMS320F2812Çü µðÁöÅÐ ½ÅÈ£ Á¦¾îÀåÄ¡¸¦ ¼±ÅÃÇß´Ù°í ¹ßÇ¥Çß´Ù. |
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